| Titolo | HfO2 films with high laser damage threshold |
|---|---|
| Tipo di pubblicazione | Articolo su Rivista peer-reviewed |
| Anno di Pubblicazione | 2000 |
| Autori | Alvisi, Marco, Di Giulio M., Marrone S.G., Perrone M.R., Protopapa Maria Lucia, Valentini A., and Vasanelli L. |
| Rivista | Thin Solid Films |
| Volume | 358 |
| Paginazione | 250-258 |
| ISSN | 00406090 |
| Parole chiave | Dual-ion-beam sputtering, Electron beams, evaporation, Fused silica, Gas lasers, Hafnium compounds, Hafnium dioxide, Ion beams, Ion-assisted electron beam evaporation, Laser damage, Optical films, Photoacoustic beam deflection techniques, Photoacoustic effect, Sputter deposition, Substrates, Thin films |
| Abstract | Laser damage resistance studies have been performed at 308 nm (XeCl laser) by the photoacoustic beam deflection technique, on hafnium dioxide (HfO2) thin films deposited on fused silica substrates either by the ion-assisted electron beam evaporation technique or by a dual-ion-beam sputtering technique. Films of quite high laser damage threshold (7 J/cm2) have been deposited by the electron beam evaporation technique. The optical and structural film characteristics and their relation to damage threshold have also been investigated. |
| Note | cited By 84 |
| URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-0033901956&doi=10.1016%2fS0040-6090%2899%2900690-2&partnerID=40&md5=4d23311c6903e250291d01d68952d325 |
| DOI | 10.1016/S0040-6090(99)00690-2 |
| Citation Key | Alvisi2000250 |
