| Titolo | Sputtered WO3 films for water splitting applications |
|---|---|
| Tipo di pubblicazione | Articolo su Rivista peer-reviewed |
| Anno di Pubblicazione | 2016 |
| Autori | Valerini, D., Hernández S., Di Benedetto Francesca, Russo N., Saracco G., and Rizzo A. |
| Rivista | Materials Science in Semiconductor Processing |
| Volume | 42 |
| Paginazione | 150-154 |
| ISSN | 13698001 |
| Parole chiave | Amorphous films, Columnar structures, Crystal structure, Different thickness, Electrochemical characterizations, Energy gap, Oxide films, Oxides, Sputtering, Sputtering deposition, Tungsten, Tungsten compounds, Tungsten oxide, Tungsten oxide films, Water splitting, WO<sub>3</sub> |
| Abstract | Tungsten oxide films with different thickness were grown by sputtering deposition. Analysis of sample morphology showed that the films were constituted by sub-micrometric columnar structures, with diameters in the range 100-500 nm. As-deposited films revealed an almost-amorphous crystal structure and a wide optical band-gap of about 3.28 eV. Thermal annealing at 500 °C was used to promote the formation of a monoclinic WO3 crystal structure and the reduction of the band-gap. Photo-electrochemical characterizations were used to compare the responses of the different films and to evaluate their possible use in water splitting applications. © 2015 Elsevier Ltd. |
| Note | cited By 1 |
| URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84958897635&doi=10.1016%2fj.mssp.2015.09.013&partnerID=40&md5=e7c4c095fe1213d8f80d4d3a36e1964a |
| DOI | 10.1016/j.mssp.2015.09.013 |
| Citation Key | Valerini2016150 |
