| Titolo | Structural and optical modification in hafnium oxide thin films related to the momentum parameter transferred by ion beam assistance |
|---|---|
| Tipo di pubblicazione | Articolo su Rivista peer-reviewed |
| Anno di Pubblicazione | 1999 |
| Autori | Alvisi, Marco, Scaglione S., Martelli S., Rizzo A., and Vasanelli L. |
| Rivista | Thin Solid Films |
| Volume | 354 |
| Paginazione | 19-23 |
| ISSN | 00406090 |
| Parole chiave | Deposition, Film growth, Hafnium compounds, Ion beams, Ion bombardment, Ion momentum transfer, Optical films, Optical glass, Phase transitions, Silica, spectrophotometry, Substrates, Thin films, X ray diffraction analysis |
| Abstract | Hafnium oxide (HfO2) films were deposited on silica and glass substrates by ion (Xe+) assisted deposition with increasing ion momentum transfer to the growing film. The relationship among the ion momentum values, the crystalline phase and the refractive index (packing density) has been worked out by means of X-ray diffraction and spectrophotometric analysis. Compaction of the films by ion beam assistance is clearly evidenced by the changes in their microstructure. A three steps transition from a random monoclinic phase, via amorphous phase, up to an highly phase oriented (fiber texture), as a function of ion momentum, has been found. |
| Note | cited By 67 |
| URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-0033366037&doi=10.1016%2fS0040-6090%2899%2900534-9&partnerID=40&md5=0d54d849072529016134534bc9a668d3 |
| DOI | 10.1016/S0040-6090(99)00534-9 |
| Citation Key | Alvisi199919 |
