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Characterisation of ZnS:Mn thin films by Rietveld refinement of Bragg-Brentano X-ray diffraction patterns

TitleCharacterisation of ZnS:Mn thin films by Rietveld refinement of Bragg-Brentano X-ray diffraction patterns
Publication TypeArticolo su Rivista peer-reviewed
Year of Publication1999
AuthorsTagliente, M.A., Penza Michele, Gusso M., and Quirini A.
JournalThin Solid Films
Volume353
Pagination129-136
ISSN00406090
KeywordsBragg-Brentano X ray diffraction patterns, Crystal microstructure, evaporation, Magnetron sputtering, Rietveld method, Semiconducting films, Structure (composition), Thermal vacuum evaporation, Thickness measurement, X ray diffraction analysis, Zinc sulfide
Abstract

In this work, we investigate ZnS:Mn polycrystalline thin films deposited onto glass substrates coated by tin or bismuth buffer layers, by using X-ray diffraction in the conventional Bragg-Brentano geometry. The ZnS:Mn thin films were deposited via radio frequency magnetron sputtering from a ZnS:Mn target (0.1% atomic Mn) and the buffer layers by thermal vacuum evaporation. A suitable algorithm were introduced in the Rietveld routine for powder diffraction data in order to model the X-ray diffraction patterns of the multilayers. The experimental results reveal that the microstructure and the crystalline phase of the ZnS films depend decisively on the structural and microstructural properties of the buffer layers.

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URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-0033327323&doi=10.1016%2fS0040-6090%2899%2900395-8&partnerID=40&md5=117f71a0fafe2c3fd9dc80f556f622ff
DOI10.1016/S0040-6090(99)00395-8
Citation KeyTagliente1999129