| Titolo | Tungsten trioxide (WO3) sputtered thin films for a NOx gas sensor |
|---|---|
| Tipo di pubblicazione | Articolo su Rivista peer-reviewed |
| Anno di Pubblicazione | 1998 |
| Autori | Penza, Michele, Tagliente M.A., Mirenghi L., Gerardi C., Martucci C., and Cassano Gennaro |
| Rivista | Sensors and Actuators, B: Chemical |
| Volume | 50 |
| Paginazione | 9-18 |
| ISSN | 09254005 |
| Parole chiave | Chemical sensors, Electric current measurement, Electric resistance, Film growth, glass, Nitrogen oxides, Secondary ion mass spectrometry, Sputter deposition, Substrates, Thin films, Tungsten compounds, Tungsten trioxide sputtered thin films, X ray diffraction analysis, X ray photoelectron spectroscopy |
| Abstract | WO3 thin films have been deposited by reactive rf sputtering onto low-cost glass substrates as gas sensitive coatings. The properties of the grown films have been investigated by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS) in order to characterize their structure, composition, surface chemistry. The d.c. electrical response to different gases of the WO3 thin films has been measured in the temperature range from 100 to 400°C showing an increase of electrical resistance with a good sensitivity towards NOx gas at 250°C. WO3 thin films oppositely detect also NH3, H2, H2S, SO2 gases by decreasing the electrical resistance and are practically insensitive to interfering gases like CO, CH4 in the same temperature range. The sensing characteristics of the NOx gas detector based on tungsten trioxide (WO3) thin films are reported. © 1998 Elsevier Science S.A. All rights reserved. |
| Note | cited By 125 |
| URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-0032119866&partnerID=40&md5=8e99451ba3b620e3f4cca5abdc79fe58 |
| Citation Key | Penza19989 |
