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High-performance deep-ultraviolet optics for free-electron lasers

TitoloHigh-performance deep-ultraviolet optics for free-electron lasers
Tipo di pubblicazioneArticolo su Rivista peer-reviewed
Anno di Pubblicazione2002
AutoriGatto, A., Thielsch R., Heber J., Kaiser N., Ristau D., Günster S., Kohlhaas J., Marsi M., Trovò M., Walker R., Garzella D., Couprie M.E., Torchio P., Alvisi Marco, and Amra C.
RivistaApplied Optics
Volume41
Paginazione3236-3241
ISSN00036935
Abstract

Working with wavelengths shorter than the deep ultraviolet involves the development of dedicated optics for free-electron lasers with devoted coating techniques and characterizations. High-performance deepultraviolet optics are specially developed to create low-loss, high-reflectivity dielectric mirrors with long lifetimes in harsh synchrotron radiation environments. In February 2001, lasing at 189.7 nm, the shortest wavelength obtained so far with free-electron-laser oscillators, was obtained at the European Free-electron-laser project at ELETTRA Synchrotron Light Laboratory, Trieste, Italy. In July 2001, 330-mW extracted power at 250 nm was measured with optimized transmission mirrors. Research and development of coatings correlated to lasing performance are reported. © 2002 Optical Society of America.

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URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-0036603101&partnerID=40&md5=e0d684944ccf2f02d27e4242814e0387
Citation KeyGatto20023236